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4.2 · Catalog note

Sac filtrant pour ponçage propre 3M,MC DTM Full face masks must be Grain:2000 apprêt-et-scellant Anti charge stearate F-20757-500

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Description

Sac filtrant pour ponçage propre 3M,MC DTM Full face masks must be Grain:2000 apprêt et scellant Anti charge stearate F 20757 500 Full face masks must be quantitatively fit tested to be assigned a characteristic protection factor greater than 10 in negative pressure mode 5 1 2" x 9" Grain P1200 Feuille abrasive Wetordry™ 401Q

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